JVX7200

New X-ray metrology for advanced front-end processes

jvx7200The latest multichannel platform from Jordan Valley, the JVX7200â„¢, provides manufacturers with production-worthy X-ray metrology capabilities for advanced front-end-of-line processes. In common with all Jordan Valley's JVX tools, the platform was designed to provide high accuracy and repeatable metrology, high uptime and low cost-of-ownership.

The JVX7200â„¢configuration combines advanced high-resolution X-ray diffraction (HRXRD) and X-ray reflectivity (XRR) channels to provide composition, thickness, strain, relaxation characterization and metrology for epitaxial layers such as SiGe and Si:C, which are required for strained silicon processes. Additionally, the XRR channel can provide valuable information on other thin-films, such as those found in high-k gate stacks. The tool is capable of providing rapid, in-line measurements and analysis on both blanket and product wafers.

JVX 7200 Product received the Best of WEST Award 2010

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Features

  • Low-power, high-brightness X-ray tube
  • Convergent beam
  • Low-noise, high-resolution 1D detectors
  • Small spot size
  • Pattern recognition system
  • High-precision staging
  • Muti-core computer running Windows XP
  • Advanced data analysis algorithms and software
  • Various loadport options
  • Proven SECS/GEM and 300 mm software
  • High uptime and low MTBF
  • CE, S2, S8 and Peer Group automation certifications

Benefits

  • Dependable operation and low COO
  • No alignment overheads
  • Fast measurement times
  • Product wafer capability
  • Fast and familiar tool operation
  • Online/offline analysis of composition, thickness, strain and relaxation of epitaxial layers
  • Reliable and robust factory automation
  • Low COO and high availability
  • Safe and reliable operation

 

Applications

  • Strained silicon process control of SiGe, Si:C epilayers
  • Thickness, roughness and density of thin layers, including FEOL high-k / metal gate stacks