JVX 6200
Jordan Valley extends its technology lead with the next-generation, 3-channel 6200 metrology platform
Jordan Valley continues to set a new standard in metrology with the next-generation, 3-channel JVX 6200 metrology platform. The 6200 combines high-speed XRR and XRF technology with the addition of SAXS measurement capability. The result? Unsurpassed extendibility and versatility, which deliver dramatic cost-of-ownership advantages.
- Independent Thickness, Density and Roughness Measurement
- Addition of industry-leading Small Angle X-Ray Scattering (SAXS) capability for measurement of pore size and distribution, capable of pore size determination with pore diameters down tsub-10Å.
- Significantly Improved Cost of Ownership
- Smaller maintenance footprint
- Higher throughput on XRR brightness (flux per area)
- Higher throughput on XRF flux
- Real time processing via new algorithms and dual processor
- Less frequent PM intervals
- Improved reliability via 2X longer life XRR tube, and more reliable XRF detectors
- Improved Ease-of-Use and Extendibility
- Color camera/higher magnification microscope
- New WinXP® operating system
- Improved pattern recognition with edge models and improved lowcontrast feature performance
- Improved "smart" algorithms allowing broader search ranges
- SAXS
- Better stage stepping resolution
- Smaller spot and required pad size XRR and XRF
- Better performance on high scatter samples and ultrathin films (<30Å)
- Extended thickness range XRR
- Bump Alloy Composition
- Void Detection
- Metals: Cu, Ti, Al, Ta, W, Alloys, etc.
- Dielectrics: Oxides, Nitrides, Poly, etc.
- High k and Low k Dielectrics
- Silicides: WSix, TiSix, CoSix, NiSix, etc.
- Magnetic RAM
- Multi-Layer Stacks
- Ultra-Thin Layers Down t10Å
- Epi- and Poly-Si1-x Gex Stoichiometry
- WSix, TaOx Stoichiometry
- ONO, SiON, SiRN




