The JVX6200 Series Production-line proven X-ray metrology platform for FEOL, BEOL and WLP

The JVX 6200 multichannel platform offers significant thin films metrology capabilities of opaque or transparent thin films with excellent track record of accuracy and repeatability, high uptime & low cost of ownership. The platform may include up to three metrology channels on a single system: XRR (X-Ray Reflectivity), XRF (X-Ray Fluorescence) or WAXRD (Wide angle X-ray diffraction) and SAXS (Small Angle X-Ray Scattering) for high-speed and non-destructive characterization of all film types. The platform support fully automated modern fabs. The JVX 6200 is utilized for advanced process control at the back-end of line (BEOL) and front end of line (FEOL) advanced processes of 70% of top 25 largest Semiconductor logic & memory fabs worldwide.The JVX6200i provide significant throughput improvements for demanding applications.

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