Jordan Valley provides a comprehensive family of JVX™ metrology tools for thin-film measurements. These novel, rapid, non-contacting, and non-destructive technologies provide the power and flexibility that enables customers to develop current- and next-generation materials and processes.

The JVX family combines second-generation fast X-ray reflectivity (XRR), micro-spot X-ray fluorescence (XRF), and industry-leading small angle X-ray scattering (SAXS) technologies that deliver significant technological and business advantages to semiconductor manufacturers.

The SAXS channel provides the capability to measure pore size and distribution in porous low-k films, backed by data that has shown excellent correlation to PALS techniques and minimum pore size detection to sub-10Å diameter pores. Additionally, these systems' speed, reliability and extendibility significantly reduce cost of ownership - which is of paramount importance in the industry today. Jordan Valley metrology platforms feature a smaller maintenance footprint, reduced preventative maintenance, higher throughput on XRR brightness and XRF flux, new algorithm sophistication and a dual-processor CPU that enable true real-time processing. Combined, these features reduce total cost of ownership and provide an ideal solution to high-volume semiconductor manufacturers.