X-ray Technology

Advanced X-ray technology that delivers unmatched versatility, accuracy and precision.

Jordan Valley provides a comprehensive family of metrology tools for thin-film measurements. The JVX™ product portfolio, together with the BedeMetrix series, offer novel, rapid, non-contacting, and non-destructive technologies that deliver the power and flexibility that enables customers to develop and monitor current- and next-generation materials and processes.

These industry-leading tools combine fast X-ray reflectivity (XRR), micro-spot X-ray fluorescence (XRF), X-ray diffraction (XRD), Grazing Incidence X-ray Scattering (GI-SAXS), and high-resolution X-ray diffraction (HRXRD) technologies that deliver significant business advantages to high-volume semiconductor manufacturers, including maximized yield and reduced cost of ownership. In addition, Jordan Valley metrology platforms feature a smaller footprint, reduced preventative maintenance, higher brightness and throughput on both the XRR and XRF channels, new algorithm sophistication and a dual-processor CPU that enable true real-time processing of X-ray data.

Fast X-ray Reflectivity (XRR)

Jordan Valley metrology solutions employ X-ray reflectivity for a surface-sensitive characterization and metrology technique that delivers precise, accurate characterization of thin films and multilayers. Thickness, roughness, density and porosity of single and multiple thin films from 1nm to 500nm comprise just a few of the measurements enabled by the JVX and BedeMetrix XRR channels. Jordan Valley’s advanced XRR technology ensures that modeling is uninfluenced by n and k changes, and offers superior throughput and brightness (flux per area).

X-ray Fluorescence (XRF)

Jordan Valley energy dispersive X-ray Fluorescence technology uses patented multi-detector system with very efficient detection system and smallest spot-size in the market. Measurements are made in seconds to provide metrology for high-volume manufacturing. Fundamental parameter implementation when combined with fully automated data collection and analysis allows for very simple recipes which can work across a wide range of thickness and composition of metal layers ranging from few nano-meters to several microns. Small spot allows measurements on test structure of the size of 50μm.

Grazing Incidence Small Angle X-ray Scattering (GI-SAXS)

JVX metrology systems feature a grazing incidence SAXS channel that offers a unique, non-destructive analytical capability that reveals valuable information on the shape, size and distribution of particles and pores in and on thin-films. This technique is based on measuring and modeling the 2D intensity distribution of elastically scattered X-rays at small angles around the reflected beam. Unlike conventional SAXS, Jordan Valley’s GISAXS technology provides the capability to measure pore size and distribution in porous low-k films, backed by data that has shown excellent correlation to PALS techniques and minimum pore size detection to sub-10Å diameter pores.

High-Resolution X-ray Diffraction (HRXRD)

Jordan Valley metrology tools offer leading-edge HRXRD technology for critical epi-related applications including thickness, composition (including graded layers), strain and lattice relaxation of epitaxial layers with unsurpassed precision and sensitivity. High-flux and high-brightness source options provide the capability to measure both blanket and product wafers. This technique provides the highest strain sensitivity and has proven itself in the fab for both materials and process R&D; and monitoring. In addition to SiGe, Si:C and sSOI in the advanced silicon semiconductor industry, HRXRD is key for compound semiconductor applications, such as LED and laser manufacturing.