Jordan Valley extends its technology lead with the next-generation, 3-channel 6200 metrology platform

Jordan Valley continues to set a new standard in metrology with the next-generation, 3-channel JVX 6200 metrology platform. The 6200 combines high-speed XRR and XRF technology with the addition of SAXS measurement capability. The result? Unsurpassed extendibility and versatility, which deliver dramatic cost-of-ownership advantages.

ADVANTAGES
  • Independent Thickness, Density and Roughness Measurement
  • Addition of industry-leading Small Angle X-Ray Scattering (SAXS) capability for measurement of pore size and distribution, capable of pore size determination with pore diameters down tsub-10Å.
  • Significantly Improved Cost of Ownership
    • Smaller maintenance footprint
    • Higher throughput on XRR brightness (flux per area)
    • Higher throughput on XRF flux
    • Real time processing via new algorithms and dual processor
    • Less frequent PM intervals
    • Improved reliability via 2X longer life XRR tube, and more reliable XRF detectors
  • Improved Ease-of-Use and Extendibility
    • Color camera/higher magnification microscope
    • New WinXP® operating system
    • Improved pattern recognition with edge models and improved lowcontrast feature performance
    • Improved "smart" algorithms allowing broader search ranges
ADDED CAPABILITIES
  • SAXS
  • Better stage stepping resolution
  • Smaller spot and required pad size XRR and XRF
  • Better performance on high scatter samples and ultrathin films (<30Å)
  • Extended thickness range XRR
APPLICATIONS
  • Bump Alloy Composition
  • Void Detection
  • Metals: Cu, Ti, Al, Ta, W, Alloys, etc.
  • Dielectrics: Oxides, Nitrides, Poly, etc.
  • High k and Low k Dielectrics
  • Silicides: WSix, TiSix, CoSix, NiSix, etc.
  • Magnetic RAM
  • Multi-Layer Stacks
  • Ultra-Thin Layers Down t10Å
  • Epi- and Poly-Si1-x Gex Stoichiometry
  • WSix, TaOx Stoichiometry
  • ONO, SiON, SiRN