High-volume semiconductor fabs worldwide rely on Jordan Valley's complete family of metrology solutions based on high-speed, non-destructive XRR, XRF, GI-SAXS and HRXRD technologies. The JVX 6200 and 6200i platforms, combined with Bede metrology solutions, set the standard in extendibility, versatility, and cost of ownership. And deliver unmatched speed, resolution and precision for all film types.
The leading metrology solution for FEOL, BEOL and WLP in one platform!
Proven in 70% of top 25 semiconductor fabs worldwide.
Metrology qualified for most advanced semiconductor processes: 45nm and 32nm and beyond
Fast X-ray Reflectance (XRR) capable of first principle, independent Thickness, Density and Roughness Measurement
Micro-spot X-ray fluorescence (XRF) provides the smallest spot size available and multi-channel detectors for fast data acquisition.
Addition of industry-leading Small Angle X-Ray Scattering (SAXS) capability for measurement of pore size and distribution, capable of pore size determination with pore diameters down to 7Å
Field proven analytical tools (JVXRR) enables fast, accurate and reputable data analysis.
The JVX6200i provides significant throughput improvements of all three metrology channels.
» XRR: 25% shorter acquisition
» XRF: 67% shorter acquisition
» SAXS: 75% shorter acquisition
JVX6200i also provides a significant increase in utilization with improved reliability and diagnostics capabilities.
Industry leading Ease-of-Use:
» Microsoft Windows® XP Professional
» Color camera with high magnification microscope
» Improved pattern recognition with edge models and improved low-contrast feature performance
» Improved "smart" algorithms allowing broader search ranges
» Available remote operations and diagnostics
XRF: Bump Alloy Composition
XRR & XRF: Void Detection
XRR: Seed / Barrier Metals: Cu, Ti, Al, Ta, W, Alloys, etc.
XRF: Interconnect CMP Control
XRR: ONO multilayers
XRR: High k / Metal Gate structures
XRR: Silicides: WSix, TiSix, CoSix, NiSix, etc.
XRR: Magnetic RAM
WA-XRD: Cu Microstructure control